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Natural oxides on air-exposed and chemically treated InGaP surfaces grown by metalorganic vapor phase epitaxy

机译:金属有机气相外延生长在空气暴露和化学处理的InGaP表面上的天然氧化物

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摘要

Chemical properties of natural oxides on air-exposed and chemically treated In0.49Ga0.51P surfaces grown by metalorganic vapor phase epitaxy were systematically investigated by x-ray photoelectron spectroscopy. An air-exposed sample exhibited a highly In-rich surface which included a large amount of natural oxides. From the valence-band spectra and energy separations between core levels, it was found that the InPO4-like chemical phase was dominant in natural oxides of air-exposed InGaP surfaces. Chemical surface treatments in HCl and HF solutions were effective in reducing natural oxide and in recovering the surface stoichiometry.
机译:通过X射线光电子能谱系统地研究了通过有机金属气相外延生长在空气暴露和化学处理的In0.49Ga0.51P表面上的天然氧化物的化学性质。暴露于空气中的样品表现出高度富In的表面,其中包含大量的天然氧化物。从价带谱和核心能级之间的能量分离,发现在暴露于空气的InGaP表面的天然氧化物中,类似InPO4的化学相占主导地位。在HCl和HF溶液中进行化学表面处理可有效减少天然氧化物并恢复表面化学计量。

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